Apparel Footwear Banner
ETCAD

Today's customers want it all, easy to use, quality and value, all through a customised experience. The brands, retailers and garment manufacturers who explore this new reality and make speed market the top priorities are the ones who will win.

Those equipped with ETCAD supported by SAMR Technology —a trusted platform in the fashion industry—will be ready for the challenge. The ETCAD Platform combines a powerful basket of fully integrated software tools capable of taking your imagination from concept to retail with the speed and efficiency that the market demands.

Drawdown your imagination using 3D Software further seamlessly integrate your 3D renderings to ETCAD Pattern Design. Automate your markers in Intelligent Nesting in combination with Planning Tool for material allocation for iECHO Spreading and Cutting.

API with DeSL, the industry's leading PLM software, ensures that data is seamlessly published in in its Cloud for teams to access it domestically and internationally.

Pattern Design

Pattern Design

Vector convert to Embroidery

Easy to bead and fix a position for Embroidery Piece

Patent name: Method and apparatus for turning bitmap representation of a graph into vector shadow lines Patent number: ZL20101050146

Marker Making

Marker Making

Easy Marking for production with material width, Length, Colour and Size.

ET System provide two methods to place piece: Overlapped automatically placed nearby and Drag/Slip placed.

Intelligent Nesting

Intelligent Nesting

Automatic Server Based Super Nesting